pixel scaling ( from microns to sub microns pixel pitch), new technology breakthrough must be introduced
challenges:
pixel crosstalk
diffraction
low light sensitivity
Technology enablers
to make a taller photodiode ( thicker active Si layer) , DTI ( Deep Trench Isolation)
VTG (Vertical Transfer Gate)
buried CFA
usually realised as Back side Illumination (BSI) configuration
narrow metal grids for crosstalk suppression
narrow dielectric wall for Quantum Efficiency improvement
new process:
high-k passivation films
new die-stacking and interconnects:
Triple die stack ( CIS + ISP + DRAM )
benefits:
higher spatial resolutions
higher color fidelity
adaptive digital pixel binning
ncbi pmc gov
sharpcap forum
Sony IMX650 sensor in Huawei P30 Pro, low light test
some astrophotos
comet Neowise C2020 F3 from bbyaya george chan(IMX650), handheld:
from Lu Tai Nin, Huawei P20 Pro (IMX600) with tripod:
13 July 2021, from Sony marketing on mobile ccd sensor evolution:
"The evolution of CMOS image sensors and the prospects utilizing advanced imaging technologies promise to improve our quality of life. CMOS image sensors now dominate the market of digital cameras with the advent of parallel ADCs and back-illuminated technology. Moreover stacked CMOS image sensors continue to enhance functionality and user experience in mobile devices.
We introduce the evolution of image sensor architecture for accelerating drastic performance improvements and for integrating edge computing connected to the sensor layer through stacking technologies. Furthermore, the fine pitch connection between the pixel and logic layers makes pixel parallel circuit architecture practical for the next stage of evolution."
semi engineering
TechInsights
android authority , comparison with Samung GE1, pixel binning, noise removal and sharpening
digital image processing from Gonzalez and Woods, Chap 4 Sec 4.3, 4.4; Chap 5 Sec 5.1 – 5.3 (pages 167-184 and 220-243)
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